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Barrier layer by ALD (Atomic Layer Deposition) (2022)

■ “nano tech 2022” (Jan. 2022)

■References

1) T. Yuki, T. Nishikawa, M. Sugimoto, H. Nakada, M. Koden, IDW’20, FLX2-3 (2020).
“High Temperature Tolerant Barrier Film with Stacking Barrier Layers by Sputtering and ALD”

2) T. Yuki, T. Nishikawa, M. Sugimoto, H. Nakada, M. Koden, ITE Trans. on MTA Vol. 9, No. 4, pp. 216-221 (2021).
“High Temperature Tolerant Barrier Films with Stacking Barrier Layers by Sputtering and ALD”

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Home (Nakada/Furukawa/Yuki/Koden group) Member Topics Technology Publication Activity Contact

Innovation Center for Organic Electronics (INOEL), Yamagata University
1-808-48 Arcadia, Yonezawa, Yamagata 992-0119, Japan　　TEL：+81-238-29-0575　　FAX：+81-238-29-0569

Prof. H. Nakada: nakada(at)yz.yamagata-u.ac.jp 　　Prof. M. Koden: koden(at)yz.yamagata-u.ac.jp (“at” should be changed by @.)